Improving Masked Autoencoders by Learning Where to Mask

Haijian Chen, Wendong Zhang, Yunbo Wang, Xiaokang Yang
3/12/2023
cs.CV

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Abstract

Masked image modeling is a promising self-supervised learning method for visual data. It is typically built upon image patches with random masks, which largely ignores the variation of information density between them. The question is: Is there a better masking strategy than random sampling and how can we learn it? We empirically study this problem and initially find that introducing object-centric priors in mask sampling can significantly improve the learned representations. Inspired by this observation, we present AutoMAE, a fully differentiable framework that uses Gumbel-Softmax to interlink an adversarially-trained mask generator and a mask-guided image modeling process. In this way, our approach can adaptively find patches with higher information density for different images, and further strike a balance between the information gain obtained from image reconstruction and its practical training difficulty. In our experiments, AutoMAE is shown to provide effective pretraining models on standard self-supervised benchmarks and downstream tasks.

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Cite this paper

@article{chen2023improving,
  title  = {Improving Masked Autoencoders by Learning Where to Mask},
  author = {Haijian Chen and Wendong Zhang and Yunbo Wang and Xiaokang Yang},
  year   = {2023},
  eprint = {2303.06583},
  archivePrefix = {arXiv},
  url    = {http://arxiv.org/abs/2303.06583v2}
}

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